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Title |
Associate Professor |
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Research Fields, Keywords |
Semiconductor engineering, Semiconductor devices, Physics of semiconductor, Semiconductor manufacturing processes |
KOYAMA Masatoshi
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Graduating School 【 display / non-display 】
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Osaka Institute of Technology Faculty of Engineering Department of Electrical and Electronic Systems Engineering Others
Graduate School 【 display / non-display 】
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Osaka Institute of Technology Graduate School of Engineering Electrical and Electronic Engineering Doctor's Course Completed Others
Degree 【 display / non-display 】
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Osaka Institute of Technology - Doctor(Engineering) Physics of Semiconductor, Devices
Association Memberships 【 display / non-display 】
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The Electrochemical Society Others
Committee Memberships 【 display / non-display 】
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2024.06-Now
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2021.04-2023.03
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2024.04-Now
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2018.06-Now
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2019.07
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD 2019) Technical Program Committee
Research field 【 display / non-display 】
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Electronic materials/Electric materials
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Physics of semiconductors
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Semiconductor engineering
Papers 【 display / non-display 】
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Heat Resistance Improvement of Palladium Pre Plated Frames of Semiconductor Packaging with a New Additive for Nickel Plating
S. Sekiguchi, S. Mizuhashi, Y. Sato, M. Koyama, Y. Shindo ( Multiple Authorship )
CS MANTECH Digest of papers 2025.05
Research paper (international conference proceedings) English
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Electron-Beam Deposition with Low Spitting Silver Source Material Improved by New Impurity Removal Processes
Y. Fujimoto, T. Kobayashi, M. Koyama, Y. Shindo ( Multiple Authorship )
CS MANTECH Digest of papers 2025.05
Research paper (international conference proceedings) English
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Electron-beam Deposition with Low Spitting Platinum Source Material Improved by New Impurity Removal Processes
Atsushi Kawashimo, Takahiro Kobayashi, Masatoshi Koyama, Yuichiro Shindo ( Multiple Authorship )
CS MANTECH Digest of papers 2024.05
Research paper (international conference proceedings) English
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Fabrication and characterization of low barrier height InAs/GaxIn1-xAs/InAs heterostructure diodes toward millimeter-wave detection
Moto Inou,; Masatoshi Koyama, Toshihiko Maemoto, and Shigehiko Sasa ( Multiple Authorship )
2023 48th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz) 2023.10
Research paper (international conference proceedings) English
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Repeated bending durability evaluation of ZnO and Al-doped ZnO thin films grown on cyclo-olefin polymer for flexible oxide device applications
K Oura, T Kumatani, H Wada, M Koyama, T Maemoto, S Shigehiko ( Multiple Authorship )
Japanese Journal of Applied Physics 2022.09
Research paper (scientific journal) English
Review Papers 【 display / non-display 】
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Characterization of physical properties and UV photoresponse of amorphous GaOx thin films grown on c-plane sapphire substrates by mist CVD method
Iori YAMASAKI Shunsuke ENOKI Misaki NISHIKAWA Masatoshi KOYAMA Akihiko FUJII Toshihiko MAEMOTO ( Joint Work )
IEICE Technical Report ( IEICE ) ED2025-17 2025.06
Introduction and explanation (scientific journal) Japanese
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UV Detection Properties of Mist CVD Grown Amorphous Ga2O3 Thin Films
Manami MIYAZAKI, Iori YAMASAKI, Yuma TANAKA, Masatoshi KOYAMA, Akihiko FUJII and Toshihiko MAEMOTO ( Joint Work )
IEICE Technical Report ( IEICE ) ED2024-17 15 - 18 2024.08
Introduction and explanation (scientific journal) Japanese
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Fabrication and Characterization of Indium Oxide Thin Thin-Film Transistors using Excimer Light Assist Process
Ryosuke KASAHARA Takeaki KOMAI Hideo WADA† Masatoshi KOYAMA Akihiko FUJII Akihiro SHIMIZU Noritaka TAKEZOE Shion YAMAGUCHI Hiroyasu ITO and Toshihiko MAEMOTO ( Joint Work )
IEICE Technical Report ( IEICE ) ED2024-15 8 - 11 2024.08
Introduction and explanation (scientific journal) Japanese
Research Grants and Projects 【 display / non-display 】
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Project Year：2024.04 - 2025.03
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Project Year：2021.04 - 2024.03
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Project Year：2020.04 - 2024.03
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Project Year：2019.04 - 2022.03
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Project Year：2017.04 - 2021.03
Presentations 【 display / non-display 】
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Characterization of physical properties and UV photoresponse of amorphous GaOx thin films grown on c-plane sapphire substrates by mist CVD method
Iori YAMASAKI, Shunsuke ENOKI, Misaki NISHIKAWA, Masatoshi KOYAMA, Akihiko FUJII, Toshihiko MAEMOTO
Internal meeting Oral Presentation(general)
2025.06 -
Electron-Beam Deposition with Low Spitting Silver Source Material Improved by New Impurity Removal Processes
Y. Fujimoto, T. Kobayashi, M. Koyama, Y. Shindo
International conference The 39th International Conference on Compound Semiconductor Manufacturing Technology (CS MANTECH) ( New Orleans, U.S.A. ) Poster (general)
2025.05 -
Heat Resistance Improvement of Palladium Pre Plated Frames of Semiconductor Packaging with a New Additive for Nickel Plating
S. Sekiguchi, S. Mizuhashi, Y. Sato, M. Koyama, Y. Shindo
International conference The 39th International Conference on Compound Semiconductor Manufacturing Technology (CS MANTECH) ( New Orleans, U.S.A ) Oral Presentation(general)
2025.05 -
Achieving High Current Density in AlOx/ZnO Multilayer TFTs for Flexible OLED Applications through Low-Temperature Post Annealing
Kensuke Nakata, Kaiko Yuge, Akira Fujimoto, Hideo Wada, Masatoshi Koyama, Akihiko Fujii, and Toshihiko Maemoto
International conference The 2024 International Meeting for Future of Electron Devices, Kansai ( Ryukoku Univ. Fukakusa Campus (Jojukan), Kyoto, Japan ) Poster (general)
2024.11 -
Thickness Controle in CH3NH3PbI3 Thin Film Fabrication by Bar-Coating Method for Solar Cell Application
Masaki Horie, Masatoshi Koyama, Toshihiko Maemoto, Akihiko Fujii
International conference The 16th Asian Conference on Organic Electronics(A-COE 2024) ( I-site Namba, Osaka, Japan ) Poster (general)
2024.11